Deposition of resistor materials directly on insulating substrates
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United States of America Patent
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Apr 3, 2001
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N/A
app pub date -
Apr 29, 1998
filing date -
Apr 29, 1998
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Abstract
Resistors are formed by selective etching from layered thin film material comprising an insulating substrate, a resistive material which is a mixture of a zero valence metal and a dielectric material, and a layer of conductive material.
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