Method of and apparatus for washing photomask and washing solution for photomask
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United States of America Patent
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Apr 3, 2001
Grant Date -
N/A
app pub date -
Feb 16, 2000
filing date -
May 20, 1999
priority date (Note) -
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Abstract
Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H.sub.2 gas dissolved water. The photomask is dried. Thus provided is a method of washing a photomask in a manner which permits attaining an effect of removing foreign matter equivalent or superior to that of a conventional method with a small amount of chemical solution and reducing the amounts of chemicals and high purity water.
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