Electrochemical stain prevention apparatus of submerged structure and process for producing submerged structure used in this apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 6, 2001
Grant Date -
N/A
app pub date -
Oct 25, 1999
filing date -
Feb 26, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An electrochemical stain prevention apparatus of a submerged structure comprising a submerged structure of which at least the stain prevention surface is formed of a conductive film that does not generate chlorine even by applying a potential of 5 V vs. SCE or less, a counter electrode located so as not to contact with the submerged structure, and a power supply unit for passing a direct current through the submerged structure having the conductive film formed thereon and the counter electrode. Aquatic organisms adhered to the surface of the conductive film can effectively be controlled by applying a potential of from 0.1 to 5 V vs. SCE to the submerged structure of such a stain prevention apparatus without generating chlorine. A potential applied to the conductive film of the submerged structure can be controlled with good accuracy by disposing a reference electrode between the submerged structure and the counter electrode. As the conductive film formed on the substrate of the submerged structure, a sprayed coating film made of a metal nitride can preferably be used.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully