Method and apparatus for adjustably supporting a light source for use in photolithography
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United States of America Patent
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Feb 27, 2001
Grant Date -
N/A
app pub date -
Apr 3, 1998
filing date -
Apr 3, 1998
priority date (Note) -
Expired
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Abstract
A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and optionally a diffuser for capturing a substantial portion of the gas so that the gas may be recycled in a closed-loop system. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like. A remotely-controlled XYZ micro-positioning stage facilitates alignment of the nozzle and the diffuser to the radiated energy beam.
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