Polish composition and method of use
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United States of America Patent
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Feb 27, 2001
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N/A
app pub date -
Sep 24, 1999
filing date -
Sep 24, 1999
priority date (Note) -
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Abstract
A polish composition comprising a base component and a alkylated fluorochemical oligomer. The oligomer comprises a fluorochemical oligomeric portion, an aliphatic moiety, and a linking group which links the two. The base component of the polish composition may be a wax, a silicone oil, or a mixture of the two.
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