Radiation-setting composition containing (meth)acrylic copolymers containing acid groups

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United States of America Patent

PATENT NO 6191184
SERIAL NO

09303568

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Abstract

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Radiation-setting compositions suitable for the formation of LCD spacers or protective layers which are excellent in photosetting properties (requiring no heat-setting) and development properties, have high adhesiveness to substrates and excellent mechanical characteristics, remain stable over a long storage time and show excellent working condition-dependency. Such a radiation-setting composition for the formation of LCD spacers or protective layers comprises a (meth)acrylic acid-based copolymer having an acid value of 30 to 200 and a glass transition temperature of -30 to 180.degree. C., a (meth)acrylate-based compound obtained by copolymerizing a monomer having a specific structure with a monomer at least having an acidic group, a radiation-sensitive compound and a solvent.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Masaki, Yoshihisa Shizuoka, JP 2 14
Okita, Tsutomu Shizuoka, JP 93 856
Suzuki, Nobuo Shizuoka, JP 267 4339

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