System and method for providing a lithographic light source for a semiconductor manufacturing process
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United States of America Patent
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Feb 20, 2001
Grant Date -
N/A
app pub date -
May 6, 1999
filing date -
May 6, 1999
priority date (Note) -
Expired
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Abstract
A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
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