Carrier matrix for integrated microanalysis systems, method for the production thereof and use of the same
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United States of America Patent
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Feb 13, 2001
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N/A
app pub date -
Nov 4, 1997
filing date -
Mar 29, 1995
priority date (Note) -
Expired
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Abstract
A silicon-based carrier matrix having a high ratio of surface area to volume is intended for use in integrated microanalysis systems. The carrier matrix comprises at least one layer of microporous silicon on a body of monocrystalline silicon. A method for producing the carrier matrix comprises electrochemical etching of a body of monocrystalline silicon, thereby to form at least one layer of microporous silicon on this body. The use of the carrier matrix for chemical sensors in integrated microanalysis systems, as well as in various sorts of chromatography, is also disclosed.
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