Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
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United States of America Patent
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Feb 13, 2001
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Mar 4, 1999
filing date -
Mar 4, 1999
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Abstract
Apparatus and method for the vacuum deposition of at least two different layers of thin film material onto a substrate by two different vacuum deposition processes. Also disclosed is a novel linear applicator for using microwave enhanced CVD to uniformly deposit a thin film of material over an elongated substrate.
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