Ceramics dress substrate and method of using the dress substrate
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United States of America Patent
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Jan 23, 2001
Grant Date -
N/A
app pub date -
Dec 22, 1998
filing date -
Dec 26, 1997
priority date (Note) -
Expired
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Abstract
A ceramics dress substrate of the present invention capable of both performances of cutting a cut material with a high accuracy and dressing a diamond cutting grindstone with an excellent cutting property and an reduced wearing amount of the grindstone. This ceramics dress substrate comprises sintering a mixture of ceramics grinding particles and a silicate mineral, The ceramics grinding particles are preferably uniformed and have a scratch hardness ranging from 6 to 10. Alumina grinding particles, silicon carbide and mullite are preferably used as the ceramics grinding particles, and a kaolin mineral, pyrophyllite, montmorillonite, sericite, talc and chlorite are preferably used as the silicate mineral. The ceramics dress substrate is preferably coated with glass.
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