Apparatus for supplying liquid in semiconductor manufacturing process
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United States of America Patent
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-
Jan 23, 2001
Grant Date -
N/A
app pub date -
Aug 6, 1999
filing date -
Mar 17, 1999
priority date (Note) -
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Abstract
An apparatus for supplying a liquid in a semiconductor manufacturing process includes a container storing the liquid therein, and having a gas inlet for introducing a gas and a liquid outlet for discharging the liquid pressurized by the gas, and a first filter connected to the liquid outlet of the container for removing an impurity of the liquid. The container is slopingly positioned so that the liquid outlet of the container is inclined downwardly to allow the liquid to be totally discharged therefrom. The first filter includes a plurality of plates extending outwardly form an inner surface of the first filter for allowing the liquid to be agitated therein, an outlet arranged at the bottom of the first filter for discharging a precipitated impurity, and a plurality of exhaust valves respectively arranged adjacent to the plates for allowing a gaseous impurity to be released therefrom. The apparatus further includes a second filter connected to the first filter for filtering out a residual impurity of the liquid.
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