Plasma focus radiation source
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United States of America Patent
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Jan 9, 2001
Grant Date -
N/A
app pub date -
Jul 13, 1999
filing date -
Apr 28, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
This invention relates to a plasma focus source for generating radiation at a selected wavelength, the invention involving producing a high energy plasma sheathe which moves down an electrode column at high speed and is pinched at the end of the column to form a very high temperature spot. An ionizable gas introduced at the pinch can produce radiation at the desired wavelength. In order to prevent separation of the plasma sheathe from the pinch, and therefore to prolong the pinch and prevent potentially damaging restrike, a shield of a high temperature nonconducting material is positioned a selected distance from the center electrode and shaped to redirect the plasma sheathe to the center electrode, preventing separation thereof. An opening is provided in the shield to permit the desired radiation to pass substantially unimpeded.
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