Vacuum drying of semiconductor fragments
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United States of America Patent
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Jan 9, 2001
Grant Date -
N/A
app pub date -
Dec 8, 1998
filing date -
Dec 19, 1997
priority date (Note) -
Expired
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Abstract
A method and apparatus for drying semiconductor fragment material, has at least one vacuum-tight chamber with at least one receiving means for semiconductor fragment material, and there is a means for maintaining a vacuum in the apparatus.
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