Method for inhibiting the formation and deposition of silica scale in water systems

United States of America Patent

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Nov 28, 2000
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N/A
app pub date
Mar 3, 1999
filing date
Mar 3, 1999

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Expired

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Abstract

The present invention relates to a method for inhibiting the formation and deposition of silica scale in water systems. The method includes treating the water in such water systems with an effective amount of a polyamide that exhibits secondary amine and/or ether and amide functional groups.

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Patent Owner(s)

Patent Owner	Address
NALCO CHEMICAL COMPANY	ONE NALCO CENTER NAPERVILLE IL 60563

International Classification(s)

C02F:TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Kelley, Douglas G	Naperville, IL	11	79
Moeggenborg, Kevin J	Naperville, IL	26	364
Workman, David P	Naperville, IL	25	226

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Method for inhibiting the formation and deposition of silica scale in water systems

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09261821

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PATENT NO	6153106
SERIAL NO	09261821
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09261821

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