Detergent for processes for producing semiconductor devices or producing liquid crystal devices
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United States of America Patent
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Nov 14, 2000
Grant Date -
N/A
app pub date -
Jul 2, 1999
filing date -
Aug 4, 1997
priority date (Note) -
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Abstract
The cleaner of the present invention contains, as an active ingredient, a polyphosphoric-acid-urea condensate or phosphoric-acid-urea polymer which is a reaction product from orthophosphoric acid and urea and is used for cleaning a metal surface and/or a glass surface in at least one process of a semiconductor device production process and a liquid crystal device production process. According to the present invention, an etching residue and impurities on metal (including semimetal) and glass surfaces can be cleaned off with high environmental and working safety and effectively without causing the problem of metal corrosion.
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