Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same
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United States of America Patent
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Nov 7, 2000
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N/A
app pub date -
Mar 22, 1999
filing date -
Apr 23, 1998
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Abstract
Organometallic compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organimetallic compounds and methods of forming aluminum films.
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