Method and apparatus for producing extreme ultra-violet light for use in photolithography
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United States of America Patent
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Oct 17, 2000
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N/A
app pub date -
Feb 4, 1997
filing date -
Feb 4, 1997
priority date (Note) -
Expired
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Abstract
A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturing a substantial portion of the gas so as to mitigate contamination caused thereby. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like.
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