Method for curing spin-on-glass film utilizing electron beam radiation

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6132814
SERIAL NO

08856888

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An electron beam exposure method is described which provides a means of curing spin-on-glass formed on a semiconductor wafer which insulates the conductive metal layer and planarizes the topography in the process of manufacturing multilayered integrated circuits. The method utilizes a large area, uniform electron beam exposure system in a soft vacuum environment. A wafer coated with uncured siloxane spin-on-glass is irradiated with electrons of sufficient energy to penetrate the entire thickness of the spin-on-glass and is simultaneously heated by infrared heaters. The wafer is exposed to a predetermined dose of electrons while simultaneously raised to a peak temperature in a soft vacuum environment. The electron beam and infrared heaters are then extinguished and the substrate cooled before removing from vacuum.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
ELECTRON VISION CORPORATION10317 LEAFWOOD PLACE SAN DIEGO CA 92131

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Livesay, William R San Diego, CA 87 2232
Ross, Matthew F San Diego, CA 17 245
Rubiales, Anthony L Poway, CA 3 98

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation