Apparatus for removing harmful components in a semiconductor exhaust gas
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United States of America Patent
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Oct 3, 2000
Grant Date -
N/A
app pub date -
Oct 19, 1998
filing date -
Jun 18, 1998
priority date (Note) -
Expired
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Abstract
An apparatus for removing harmful components in a semiconductor exhaust gas includes: a first water scrubber for washing with water a gas to be processed; a gas decomposer tower disposed downstream of the first water scrubber; a second water scrubber disposed downstream of the gas decomposer tower; and a burner tower disposed downstream of the second water scrubber for burning the processed gas, wherein the gas decomposer tower is capable of thermally decomposing a mixture gas of a saturated or unsaturated hydrocarbon gas and a perfluorocarbon or a perfluoride compound by maintaining the mixture gas at a temperature of 600.degree. C. or more in the absence of separated O.sub.2.
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