Plasma gas processing
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United States of America Patent
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Oct 3, 2000
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N/A
app pub date -
Nov 7, 1997
filing date -
Nov 28, 1996
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Abstract
A plasma enhanced gas reactor including a reaction chamber having a pair of field-enhancing electrodes each of which has an axial passage through it by one of which a reactant gas is admitted to the reaction chamber, and by the other of which reaction products are removed from the reaction chamber.
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