Method of manufacturing an optical device with a groove accurately formed
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United States of America Patent
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Sep 26, 2000
Issued Date -
N/A
app pub date -
Jan 28, 1999
filing date -
Jan 12, 1996
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Abstract
A first layer (2) and a second layer (3) are formed on a substrate (1). The first layer is made of a resist against a groove-sculpturing etchant used in etching the substrate while the second layer is made of an anti-corrosive material against dry etching. The second layer is at first patterned into a patterned second layer (3a) in the form of a groove-sculpturing mask pattern (8). With the patterned second layer used as a mask, the first layer is etched and patterned into a patterned first layer (2a) in the form of the above-mentioned mask pattern. With the patterned first layer used as a mask, the substrate is etched to form a groove (9).
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