Compound for the aluminum film from chemical vapor depositions and the method of synthesis
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United States of America Patent
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Sep 19, 2000
Grant Date -
N/A
app pub date -
Mar 31, 1999
filing date -
Sep 15, 1998
priority date (Note) -
Expired
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Abstract
Organometallic precursor compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic precursor compounds and methods of forming aluminum films.
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