Apparatus for reducing cool chamber particles
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 19, 2000
Grant Date -
N/A
app pub date -
Apr 30, 1998
filing date -
Apr 30, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An improved cool chamber is provided which includes a gas manifold for redistributing the gas flow and reducing the velocity of the gas particles that are directed towards a wafer. The gas manifold has a generally circular body that defines a plurality of outlets. A plurality of tubes, each having a first end and a second end, extend from the body. The first end is coupled to the body at the outlets. A vent diffuser is coupled to the second end of each tube. The vent diffuser includes a sintered gasket for providing point-of-use filtering of the gas and diffusion of the gas. The gas manifold is at a height different from the height of the plane of the wafer. An adapter plate that includes a bypass port is also provided. The bypass port is employed to conduct gas from the gas manifold back into the chamber during de-pressurization.
First Claim
Other Claims data not available