Controlled shrinkage of photoresist
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United States of America Patent
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Sep 12, 2000
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N/A
app pub date -
Sep 5, 1997
filing date -
Sep 5, 1997
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Abstract
A process for controlled shrinkage of photolithographic features formed in photoresist. A shrinkage profile is determined for the photoresist and sizes of the photolithographic features. The photoresist is then exposed to ultraviolet radiation and elevated temperature until the photolithographic features shrink a desired amount.
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