Apparatus for plasma jet treatment of substrates
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 22, 2000
Grant Date -
N/A
app pub date -
Nov 25, 1998
filing date -
May 31, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for processing substrates with a plasma jet with increased throughput is described. The apparatus comprises at least two carrousels for holding a plurality of substrates. Each of the carrousels includes a rotatable angle drive having a rotation axis Da, a plurality of arms extending radially from the angle drive and a plurality of rotatable substrate holders. Each of the substrate holders is connected to one of the arms, each of the rotatable substrate holders has a rotation axis Ha positioned at a distance R from the rotation axis Da of the rotatable angle drive. The carousel angle drive provides programmable motion of the substrates being treated relative to a plasma jet generator. The plasma jet generator is movable from a first position Z.sub.1 adjacent to the first carousel to a second position Z.sub.2 adjacent to the second carousel. While the substrates on the first carousel are being treated by the plasma jet, the substrates on the second carousel can be loaded or unloaded. Once the treatment of the substrates on the first carousel is completed, the plasma jet is moved from the first position Z.sub.1 to the second position Z.sub.2 to treat the substrates on the second carousel and allow loading and unloading of substrates from the first carousel.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully