Apparatus and method for depositing a substance with temperature control
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United States of America Patent
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Aug 8, 2000
Issued Date -
N/A
app pub date -
May 27, 1997
filing date -
Jun 7, 1995
priority date (Note) -
Expired
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Abstract
An apparatus for depositing synthetic diamond on a surface of a substrate includes a deposition chamber and a cooling block having a surface in the deposition chamber that is cooled by heat exchange. The substrate is supported from the cooling block so that the bottom surface of the substrate is spaced from the cooling block surface by a gap, and a gas is provided in the deposition chamber and in the gap, the gas comprising at least 30 percent hydrogen gas. A plasma deposition system forms in the chamber a plasma containing hydrogen gas and a hydrocarbon gas for depositing synthetic diamond on the top surface of the substrate.
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