Dual gas faceplate for a showerhead in a semiconductor wafer processing system
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United States of America Patent
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Jul 11, 2000
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N/A
app pub date -
Jun 16, 1998
filing date -
Jun 16, 1998
priority date (Note) -
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Abstract
A faceplate for a showerhead of a semiconductor wafer processing system having a plurality of gas passageways to provide a plurality of gases to the process region without commingling those gases before they reach the process region within a reaction chamber. The showerhead contains faceplate and a gas distribution manifold assembly. The faceplate defines a plurality of first gas holes that carry a first gas from the manifold assembly through the faceplate to the process region and a plurality of channels that couple a plurality of second gas holes to a plenum that is fed the second gas from the manifold assembly.
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