Method and apparatus for depositing diamond film
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United States of America Patent
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Jul 4, 2000
Grant Date -
N/A
app pub date -
May 12, 1997
filing date -
Jun 7, 1996
priority date (Note) -
Expired
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Abstract
An apparatus for depositing diamond film is disclosed, which comprises: a chamber; a reaction zone in the chamber; means for feeding diamond forming gases and an electron source gas into the reaction zone; means for applying an electric field across the reaction zone to accelerate free electrons of the electron source gas and dissociate hydrogen in the diamond forming gases to produce atomic hydrogen; and a deposition surface adjacent the reaction zone, whereby diamond film is deposited on the deposition surface from the diamond forming gases, assisted by the atomic hydrogen.
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