Control device
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United States of America Patent
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-
Jun 13, 2000
Grant Date -
N/A
app pub date -
Dec 11, 1998
filing date -
Jun 3, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A flow control device can variably control the flow rate with extremely high accuracy over a wide flow rate range from a high to a low flow rate with a single pump. In this flow control device, a pump is provided in a main pipe line through which fluid is fed. A bypass branches from the main pipe line at a point nearer to the discharge port than is the pump. A flowmeter and a flow control valve are provided in the bypass. In the bypass is further provided a back pressure regulating valve near the discharge port. The degree of opening of the flow control valve is adjusted based on the flow rate detected by the flowmeter. The back pressure regulating valve suppresses pressure fluctuation on the discharge side of the flow control valve.
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