Light exposing device for manufacturing semiconductor device which further removes asymmetrical aberration
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United States of America Patent
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May 23, 2000
Grant Date -
N/A
app pub date -
Mar 6, 1996
filing date -
Mar 28, 1995
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A light-exposing device for making a semiconductor device. A reticle has patterns to be exposed to light. A blind controls a light-exposing area of the reticle. An optical system between the blind and the reticle condenses light passing through the blind. Adjacent patterns on a reticle are consecutively projected by superimposing light-exposing energy. An extra optical system condenses light passing through the blind. The usable area of the reticle is maximized; the interval between patterns is not critical; and inferiority by either lack or excess of the exposure to light between the patterns is reduced.
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