Aqueous developing solutions for reduced developer residue
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United States of America Patent
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May 16, 2000
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N/A
app pub date -
Apr 29, 1998
filing date -
Apr 29, 1998
priority date (Note) -
Expired
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Abstract
An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula: R--[O--(CH.sub.2 --Ch.sub.2 --O).sub.n ].sub.m --X (I) where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 15, preferably at least about 20, more preferably at least about 30.
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