Metal ion reduction in novolak resin solution using an anion exchange resin
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United States of America Patent
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Mar 28, 2000
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Jul 29, 1997
filing date -
Aug 23, 1994
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Abstract
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing a specially treated anion exchange resin. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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