Photoresists and method for making printing plates
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United States of America Patent
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Mar 14, 2000
Grant Date -
N/A
app pub date -
Jun 19, 1996
filing date -
Jun 19, 1996
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Abstract
Printing plates having a photoresist layer thereon that can be exposed by a computer controller laser have improved sensitivity and do not require a photomask step. We have found photoresists that include a film forming polymer, an organo azide and a photosensitive dye that absorbs light at the frequency of the patterning laser and converts it to heat energy. The heat energy in turn elevates the temperature of the organo azide above its dissociation temperature, destroying the azide in areas exposed to the light source, and solubilizing those regions. A post pattern exposure flood exposure with ultraviolet light hardens the unexposed resist, improving its resistance to etch solvents.
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