Probe for slurry gas sampling
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United States of America Patent
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Feb 8, 2000
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N/A
app pub date -
Aug 4, 1998
filing date -
Aug 4, 1998
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Abstract
Device for in-situ collection of a gaseous reaction product from a polishing slurry as a workpiece, such as a semiconductor wafer, is being polished with the slurry, including a probe capable of being placed in contact with the slurry, the probe having a channel for transmitting the gaseous reaction product to an analyzer, a first hydrophobic membrane for allowing passage of the gaseous reaction product from the slurry to the channel, and means for directing a carrier gas through the channel.
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