Ultra high resolution wave focusing method and apparatus and systems employing such method and apparatus
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United States of America Patent
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Feb 1, 2000
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N/A
app pub date -
Aug 3, 1998
filing date -
Aug 5, 1997
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Expired
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Abstract
An ultra high resolution wave focusing method and apparatus is disclosed. The invention provides a focusing system having an effective numerical aperture greater than that possible using known conventional focusing techniques. By the method and apparatus of the invention, a wave of arbitrary wavefront profile and wavelength .lambda. is focused to a region of high amplitude having a spot size that approaches the fundamental limit of 0.25.lambda.. Imaging and patterning systems employing such a wave focusing method and apparatus provide ultra high resolution and ultra small feature sizes beyond the capabilities of systems utilizing conventional focusing elements.
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