Membrane-like filter element for chemical mechanical polishing slurries
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United States of America Patent
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Jan 18, 2000
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N/A
app pub date -
Apr 17, 1998
filing date -
Apr 17, 1998
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Abstract
A filter media for physically separating agglomerations of abrasive particles from a chemical-mechanical polishing (CMP) process slurry stream. The media is provided as being formed of at least one fabric sheet having a first and second surface defining a first thickness dimension of the sheet therebetween, with the fabric being woven of polymeric monofilament fibers. In service, the slurry stream is supplied to the first side of the filter media, and is passed through the media to the second side thereof such that at least a substantial portion of the agglomerations of abrasive particles are retained on the first side of the media.
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