Integrated gas control device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Jan 11, 2000
Grant Date -
N/A
app pub date -
Jan 30, 1998
filing date -
Feb 28, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates to an integrated gas control device in a high purity gas supply system for a semiconductor manufacturing apparatus in which a gas control line is made compact and gas control units are easily mounted or removed and a flow passage can be flexibly designed and a total lead time for manufacturing can be made shorter and parts can be easily replaced for changing the flow passage by using the standardized constitution parts. In the integrated gas control unit, the adjacent passage blocks are connected to each other with a metal gasket inserted therebetween such that a gas flowing-out passage communicates with the gas flowing-in passage and are mounted on a base plate along many gas supply control lines arranged in parallel. The body of the desired gas control unit such as an automatic diaphragm valve or the like which is constituted longitudinally is inserted into the mounting hole of each passage block with a gasket inserted therebetween. The gas control unit is removably connected to the passage block by screwing a connecting cylinder fitted on the body on the passage block.
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