Carbon dioxide cleaning process
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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Dec 21, 1999
Grant Date -
N/A
app pub date -
Jul 9, 1997
filing date -
Jul 9, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for cleaning parts employed during the processing of semiconductor wafers includes a first cleaning step for removing super-micron particles and a second cleaning step for removing sub-micron particles. The second step utilizes frozen carbon dioxide pellets and removes contaminant particles have a size of less than one micron. The cleaning method consistently removes substantially all sub-micron particles from a work surface.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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QUANTUM GLOBAL TECHNOLOGIES LLC | 123 N MAIN STREET DUBLIN PA 18917 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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Bishop, Phillip W | 1433 E. Butler Cir., Chandler, AZ 85225 | 1 | 137 |
# of filed Patents : 1 Total Citations : 137 | |||
Harrover, Alexander J | Tempe, AZ | 2 | 214 |
# of filed Patents : 2 Total Citations : 214 |
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Patent Citation Ranking
- 137 Citation Count
- B08B Class
- 99.39 % this patent is cited more than
- 26 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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