Carbon dioxide cleaning process

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6004400
SERIAL NO

08890116

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A method for cleaning parts employed during the processing of semiconductor wafers includes a first cleaning step for removing super-micron particles and a second cleaning step for removing sub-micron particles. The second step utilizes frozen carbon dioxide pellets and removes contaminant particles have a size of less than one micron. The cleaning method consistently removes substantially all sub-micron particles from a work surface.

First Claim

See full text

Other Claims data not available

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
QUANTUM GLOBAL TECHNOLOGIES LLC123 N MAIN STREET DUBLIN PA 18917

International Classification(s)

loading....
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances1997199819992000200120022003200420050255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bishop, Phillip W 1433 E. Butler Cir., Chandler, AZ 85225 1 137
Harrover, Alexander J Tempe, AZ 2 214

Cited Art Landscape

Load Citation

Patent Citation Ranking

  • 137 Citation Count
  • B08B Class
  • 99.39 % this patent is cited more than
  • 26 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges18746116722101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7091 - 10005101520253035404550556065707580859095

Forward Cite Landscape

Load Citation