Recovery of coolant and abrasive grains used in slicing semiconductor wafers

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6001265
SERIAL NO

08801927

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Abstract

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A system for reusing water soluble slurry waste fluid wherein separated available abrasive grains and extracted water soluble coolant are reused. This system is capable of reducing a disposal cost due to a reduction of a load to a waste water disposal plant by effectively reusing water soluble slurry waste fluid, and making a contribution to a reduction of a total slicing cost by reusing abrasive grains and water soluble coolant.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU HANDOTAI CO LTD2-1 OHTEMACHI 2-CHOME CHIYODA-KU TOKYO 1000004 ?1000004
MIMASU SEMICONDUCTOR INDUSTRY CO LTDTAKASAKI-SHI GUNMA 370-3533
OHTOMO CHEMICAL IND CORP17-10 YAHIRO 2-CHOME SUMIDA-KU TOKYO
HITACHI ZOSEN METAL WORKS CO LTD1180 AZA AMARUBE-SHIMO MAIZURU-SHI KYOTO-FU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashida, Akio Tokyo, JP 4 54
Hayakawa, Kazuo Takasaki, JP 16 197
Ito, Takara Sakai, JP 1 25
Kaburagi, Shingo Tokyo, JP 6 56
Kiuchi, Etsuo Gunma-ken, JP 15 229
Noami, Kuniaki Maizuru, JP 1 25
Toyama, Kohei Shirakawa, JP 22 242

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