Method and apparatus for inspecting a photoresist material by inducing and detecting fluorescence of the photoresist material
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United States of America Patent
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Nov 16, 1999
Grant Date -
N/A
app pub date -
Apr 2, 1997
filing date -
Apr 2, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for inspecting a substrate having a surface on which a photoresist material has been deposited. The apparatus preferably includes a device for transporting substrates through an illumination beam such that the edges of the substrates are sequentially irradiated by the beam without requiring that each substrate be individually manipulated. The illumination beam is generated and projected onto the substrates by equipment configured to produce a beam having a size, wavelength, and intensity sufficient to cause the photoresist material to fluoresce with an intensity that can be detected without magnification. Inspection can be performed manually or automated through optical equipment that can detect flaws in the photoresist based on knowledge of the patterned image desired for the photoresist.
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