Cleaning solution and cleaning method
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United States of America Patent
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Nov 16, 1999
Grant Date -
N/A
app pub date -
Jan 8, 1997
filing date -
Jan 17, 1996
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Abstract
A cleaning solution and cleaning method are provided which: (1) make treatment at room temperature possible, and do not require heating, (2) use little chemicals and water, (3) do not require specialized apparatuses, and moreover, (4) do not require the use of specialized chemicals. The cleaning solution of the present invention comprises pure water containing 20 ppb-100 ppb of oxygen and 2 ppb or more of nitrogen. Furthermore, the cleaning solution may comprise electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen. In the cleaning method of the present invention, the cleaning of a material to be cleaned is conducted in a cleaning solution comprising pure water containing 20 ppb-100 ppb of oxygen and 2 ppb-15 ppm of nitrogen, while applying ultrasound having a frequency of 30 kHz or more. Furthermore, in the cleaning method of the present invention, the cleaning of a material to be cleaned may be conducted in a cleaning solution comprising electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen, while applying ultrasound having a frequency of 30 kHz or more.
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