Developer for irradiated, radiation-sensitive recording materials
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 26, 1999
Grant Date -
N/A
app pub date -
Nov 3, 1998
filing date -
Dec 12, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A developer for irradiated, radiation-sensitive recording materials, in particular for the production of offset printing plates, which contains water, a compound which is alkaline in aqueous solution and a copolymer which acts as an emulsifier and has units of (I) a hydrophobic vinyl compound which has alkyl radicals having up to 30 carbon atoms and (II) a hydrophilic, ethylenically unsaturated carboxylic acid. Some of the carboxyl groups of the copolymer are esterified with reaction products of (A) (C.sub.1 -C.sub.30)alkanols, (C.sub.8 -C.sub.25)alkanoic acids, (C.sub.1 -C.sub.12)alkylphenols or di(C.sub.1 -C.sub.20)alkylamines with (B) (C.sub.2 -C.sub.4)alkylene oxides or tetrahydrofuran.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully