Filter arrangement having at least two successive layers having predetermined spacing and its method for making
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United States of America Patent
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Oct 19, 1999
Grant Date -
N/A
app pub date -
Dec 22, 1997
filing date -
Dec 22, 1997
priority date (Note) -
Expired
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Abstract
A filter apparatus and method wherein successive layers of filter medium are spaced apart from each other a preselected distance to create a substantially direct, in-line through-flow void space therebetween evaluated upon the porosity and thickness of the successive filter mediums, pleated spacer/filter arrangements being employed to create a combined overall filter media with an included through-flow void space for fractionated distribution of particles between the successive layers of filter medium to maximize particulate holding capacity of the overall filter media.
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