Rapid thermal processing (RTP) system with rotating substrate
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United States of America Patent
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Oct 12, 1999
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N/A
app pub date -
Oct 24, 1997
filing date -
Oct 24, 1997
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Abstract
A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.
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