Process for forming adjacent moats or holes
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United States of America Patent
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-
Aug 31, 1999
Grant Date -
N/A
app pub date -
Jan 15, 1997
filing date -
Jan 11, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A process for forming adjacent moats or holes in an electrically non-insulating substrate wherein an electrically insulating masking layer is deposited on the substrate. To form two adjacent moats or holes, the masking layer has an opening whose width is chosen so that it extends over a part of the overall width of the two moats or holes to be formed, and whose shape corresponds to the shape of the moats or holes to be formed. The surface of the masked substrate is then subjected to an anodic oxidation, with the oxidation voltage chosen to be so high that two adjacent moats or holes are formed per opening in the masking layer.
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