Light absorptive antireflector
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United States of America Patent
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Aug 24, 1999
Issued Date -
N/A
app pub date -
Aug 25, 1997
filing date -
Dec 13, 1994
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Abstract
A light absorptive antireflector comprising a substrate, a light absorbing film formed on the substrate and a silica film formed on the light absorbing film, to reduce reflection of incident light from the silica film side, wherein the geometrical film thickness of the light absorbing film is from 5 to 25 nm, and the geometrical film thickness of the silica film is from 70 to 110 nm.
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