Light absorptive antireflector

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United States of America Patent

PATENT NO 5942319
SERIAL NO

08917177

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A light absorptive antireflector comprising a substrate, a light absorbing film formed on the substrate and a silica film formed on the light absorbing film, to reduce reflection of incident light from the silica film side, wherein the geometrical film thickness of the light absorbing film is from 5 to 25 nm, and the geometrical film thickness of the silica film is from 70 to 110 nm.

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Patent Owner(s)

Patent OwnerAddress
ASAHI GLASS COMPANY LTDTOKYO 100-8405

International Classification(s)

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  • 1997 Application Filing Year
  • C03C Class
  • 265 Applications Filed
  • 134 Patents Issued To-Date
  • 50.57 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances1997199819992000200120022003200420052006200720082009201020110255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Katayama, Yoshihito Funabashi, JP 12 287
Oyama, Takuji Yokohama, JP 50 936

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Patent Citation Ranking

  • 54 Citation Count
  • C03C Class
  • 90.71 % this patent is cited more than
  • 26 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges81136629151383262401 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +05101520253035404550556065707580859095100105110115120

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