Aqueous developing solutions for reduced developer residue
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United States of America Patent
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Jul 13, 1999
Grant Date -
N/A
app pub date -
Apr 29, 1998
filing date -
Apr 29, 1998
priority date (Note) -
Expired
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Abstract
An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula: R--?O--(AO).sub.n !.sub.m --X (I) where AO are alkylene oxide units selected from ethylene oxide units (CH.sub.2 --CH.sub.2 --O) and propylene oxide units (CH(CH.sub.3)--CH.sub.2 --O) or (CH.sub.2 --CH(CH.sub.3)--O), where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 8, and the molar ratio of total ethylene oxide units to total propylene oxide units is between about 1:4 and about 4:1, preferably between about 2:3 and about 3:2.
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