Importance

Loading Importance Indicators...

Abstract

A method for manufacturing branching-off or intersecting channel-shaped waveguides on or in a substrate, which substrate encloses a light-guiding layer, and on which substrate there is applied an auxiliary-mask layer having a thickness t, the method comprising steps of: applying a first mask pattern of a first mask material in a first mask position on the auxiliary-mask layer, the first mask pattern including a subpattern for defining a first channel-shaped waveguide; etching portions of the auxiliary-mask layer not covered by the first mask pattern using first etchants, the auxiliary-mask material being etched over a first etching depth d which is less than the thickness t; removing the first mask material of the first mask pattern; applying a second mask pattern of a second mask material in a second mask position which overlaps the position of the auxiliary-mask pattern at least in part, the second mask pattern including a subpattern for defining a second channel-shaped waveguide which makes an acute angle with the first waveguide; and a second etching step for etching portions of the auxiliary-mask material not covered by the second mask material of the second mask pattern using second etchants, the auxiliary-mask material being etched over a second etching depth t-d, wherein portions of the auxiliary-mask layer not covered by the second mask material and that were not covered by the first mask material are removed such that the surface of the substrate is reached.

Loading the Abstract Image...

First Claim