Silicon micromachine with sacrificial pedestal
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United States of America Patent
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Jul 6, 1999
Grant Date -
N/A
app pub date -
Feb 7, 1997
filing date -
Feb 7, 1997
priority date (Note) -
Expired
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Abstract
A protective coating is utilized to protect the silicon during a wet chemical etch step in the process of making a micromachine, thereby preventing the formation of etched holes or pits in the micromachine. In another embodiment, silicon sacrificial pedestals are used to eliminate or greatly reduces the electrical potential difference between metal on the glass substrate and the silicon, thereby eliminating arcing and the resulting damage to silicon and metal. These pedestals may be removed after the anodic bond.
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