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Abstract

The plasma generator includes a plasma generation chamber which is pumped and into which plasma generation gas is introduced. An antenna provided outside the plasma generation chamber, a RF source supplying a RF power with the antenna to excite the antenna. A part or whole of the plasma generation chamber is made of dielectric. The antenna radiates the RF through the dielectric and includes an antenna element which longitudinal direction is vertical to the direction for the plasma. The plasma generation chamber has a side wall intersecting the longitudinal direction of the antenna element at both sides. A part or whole of a plasma generation chamber is made of dielectric having relative permittivity .epsilon..sub.S. The antenna radiates a RF through the dielectric and is comprised of multiple antenna elements which longitudinal directions are on a plane vertical to the direction for the plasma. A shield is provided at the opposite side of the electric interposing the antenna, and, the electric distance between the antenna and the shield is shorter than the length made from adding 1/.epsilon..sub.S times of the thickness of the dielectric with the distance between the dielectric and the antenna. A surface treatment apparatus using the plasma generator, includes a substrate holder for placing a substrate to be treated in parallel with the longitudinal direction of the antenna elements in the plasma generation chamber.

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First Claim